Publications


2003

[5] F. Giustino and A. Pasquarello
Atomic-scale investigation of the dielectric screening at the interface between silicon and its oxide
in “Fundamentals of Novel Oxide/Semiconductor Interfaces”, ed. by C. R. Abernathy, E. Gusev, D. Schlom, and S. Stemmer, Material Research Society Fall Meeting Proceedings, 2003 Boston, MA, Vol. 786, E5.1

[4] F. Giustino, P. Umari, and A. Pasquarello
Dielectric discontinuity at interfaces in the atomic-scale limit: Permittivity of ultrathin oxide films on silicon
Phys. Rev. Lett. 91, 267601 (2003)


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